diff --git a/markdown/dev/reference/api/config/dependencies/en.md b/markdown/dev/reference/api/config/dependencies/en.md
index 169842584c2..53d6da6634e 100644
--- a/markdown/dev/reference/api/config/dependencies/en.md
+++ b/markdown/dev/reference/api/config/dependencies/en.md
@@ -15,7 +15,7 @@ render them if they were not requested.
 
 ## Structure
 
-An plain object of `key`-`value` pairs that controls the order in which pattern 
+A plain object of `key`-`value` pairs that controls the order in which pattern 
 parts will get drafted.
 The value can either be a string, or an array of strings.
 Those strings should be part names.
diff --git a/markdown/dev/reference/api/config/hide/en.md b/markdown/dev/reference/api/config/hide/en.md
index b4b52aafd5e..db817230818 100644
--- a/markdown/dev/reference/api/config/hide/en.md
+++ b/markdown/dev/reference/api/config/hide/en.md
@@ -3,9 +3,9 @@ title: hide
 ---
 
 The `hide` key in the pattern configuration file allow you to configure
-parts the should be hidden by default.
+parts that should be hidden by default.
 *Hidden* means that they will be drafted, but not rendered. This is
-ypically used for a base part on which other parts are built.
+typically used for a base part on which other parts are built.
 
 Note that hidden parts will be rendered when the user requests 
 to [only draft some parts of a pattern](/reference/api/settings/only) 
@@ -14,7 +14,7 @@ and includes the hidden part(s).
 
 ## Structure
 
-An array with strings that hold part names.
+An array of strings that holds part names.
 
 ## Example
 
diff --git a/markdown/dev/reference/api/config/measurements/en.md b/markdown/dev/reference/api/config/measurements/en.md
index ba7894c4210..ca6d91f3cb8 100644
--- a/markdown/dev/reference/api/config/measurements/en.md
+++ b/markdown/dev/reference/api/config/measurements/en.md
@@ -2,7 +2,7 @@
 title: measurements
 ---
 
-The `measurements` key in the pattern configuration file allow you to configure
+The `measurements` key in the pattern configuration file allows you to configure
 the measurments that are required to draft the pattern.
 
 ## Structure